Raws li peb txhua tus paub, tsuas muaj ib lub chaw tsim khoom hauv ntiaj teb uas tuaj yeem tsim EUV lithography, nws yogNetherlands ASML.
Qhov laj thawj vim li cas tsuas muaj ib lub chaw tsim khoom hauv ntiaj teb yog tias ASML tau khi ntau lub tuam txhab tseem ceeb ua ke, xws li Zeiss (Zeiss), lub tuam txhab German optics, Cymer (USA), thiabTRUMPF (Lub Tebchaws Yelemees).
ASML tau khi cov tuam txhab lag luam no rau nws lub tsheb los ntawm kev nqis peev, kev yuav, kev koom tes, tsim cov chaw tshawb fawb, thiab lwm yam, thiab cov tuam txhab lag luam no, tej zaum tsuas yog cov tuam txhab tsim khoom hauv ntiaj teb uas tuaj yeem tsim cov khoom no, yog li thaum kawg tsuas yog ASML hauv ntiaj teb tuaj yeem ua tau. tsim EUV lithography.
Txawm li cas los xij, tsis ntev los no, cov saw tseem ceeb ntawm ASML, tau khiav mus rau Shenzhen, Tuam Tshoj los tsim lub Hoobkas, nws cov chaw muag khoom hauv Shenzhen tau nyob hauv Baoan Sino-German (Tebchaws Europe) Industrial Demonstration Park.
Cov chaw tsim khoom no yog lub teb chaws Yelemees TRUMPF Group (TRUMPF), nws yog ASML's EUV lithography, lub ntiaj teb tsuas yog laser qhov chaw muab khoom.
TRUMPF cov khoom hauv EUV lithography, tseem ceeb npaum li cas? Ua ntej, mloog kuv piav qhia lub hauv paus ntsiab lus ntawm EUV lithography, koj yuav nkag siab.
Lub hauv paus ntsiab lus ntawm EUV lithography, muab nws yooj yim, yog nyob rau hauv peb lub hauv paus loj, EUV ultraviolet lub teeb qhov system, lub hom phiaj daim iav system, thiab lub rooj system.
Cov txheej txheem tshwj xeeb yog siv lub laser kom zoo siab rau 13.5nm wavelength ntawm lub teeb ultraviolet huab cua, uas tom qab ntawd kho kom tsim tau lub teeb tswj lub teeb, uas yog tom qab ntawd muab tso rau hauv lub rooj photomask ua ntej projected los ntawm lub hom phiaj daim iav mus rau lub rooj raug. thiab thaum kawg etched rau hauv ib lub voj voog ntawm silicon wafer coated nrog photoresist.
Yuav ua li cas ib qho ntawm EUV UV lub teeb qhov system tau txais los ntawm kev foob pob tin (Sn) hlau tee nrog 30 kW lub zog CO2 laser, evaporating nws mus rau hauv cov ntshav, thiab thaum kawg tau txais EUV lub teeb ntawm 13.5 nm wavelength.
Qhov no 30 kW CO2 laser yog muab los ntawm TRUMPF, tsuas yog ib qho hauv ntiaj teb.
Tsis txhob xav txog qhov no CO2 laser, nws muaj 457,329 qhov chaw, cable ntev nyob rau hauv lub system yog mus txog 7,322 meters, thiab qhov hnyav yog 17,090 kg, uas yog ib qho tseem ceeb tshaj plaws nyob rau hauv EUV lithography.
Tam sim no TRUMPF tau khiav mus rau Tuam Tshoj los tsim ib lub Hoobkas, lub hom phiaj yog qhov tseeb, uas yog, kev cia siab ntawm Tuam Tshoj laser lag luam, thiab txawm tias ntau lub sij hawm saib, kev cia siab rau Suav lithography kev lag luam, yav tom ntej yuav koom tes nrog Tuam Tshoj los tsim EUV lithography. .
Qhov tseeb, twb muaj ntau tshaj ib ASML mov saw khiav mus rau Tuam Tshoj los tsim ib lub Hoobkas, muaj KMWE thiab lwm tus neeg manufacturers, kuj mus rau Tuam Tshoj los tsim ib lub Hoobkas.
Raws li cov qauv tam sim no, peb tuaj yeem ua qhov zoo cia siab tias nws yuav tsis ntev ua ntej Tuam Tshoj lub tshuab lithography yuav yog ib kauj ruam loj rau pem hauv ntej, thiab txawm tias qhov ntim ntawm cov zis EUV lithography, tuaj yeem tos ntsoov rau, koj puas xav?
